The 62nd JSAP Spring Meeting, 2015

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Oral presentation

8 Plasma Electronics » 8.1 Plasma production and control

[13p-A28-1~10] 8.1 Plasma production and control

Fri. Mar 13, 2015 4:30 PM - 7:00 PM A28 (6A-203)

6:45 PM - 7:00 PM

[13p-A28-10] Effect of Applying AC Cathode Bias in RF Magnetron Sputtering

〇Akimoto Takahiro1, Shindo Haruo1, Isomura Masao1 (1.Tokai univ.)

Keywords:plasma,sputtering