[13p-P13-1~4] 9.3 Nanoelectronics

[13p-P13-3] Development of high-precision wet etching technique for damage-free GaAs-based nanostructure formation

〇Ryota Kuroda^{1, 2}, Masaki Sato^{1, 2}, Seiya Kasai^{1, 2} (1.RCIQE, 2.Hokkaido Univ.)

Keywords:wet etching,GaAs,nanostructure