The 62nd JSAP Spring Meeting, 2015

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Poster presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

[13p-P5-1~16] 6.3 Oxide electronics

Fri. Mar 13, 2015 4:30 PM - 6:30 PM P5 (Gymnasium)

4:30 PM - 6:30 PM

[13p-P5-3] The Formation of WO3 Using Microwave Excited Plasma and Its Application to Resistive Random Access Memory

〇(M1)shota takagi1, tetsuji arai1, keisuke arimoto1, jyunji yamanaka1, kiyokazu nakagawa1, takamatsu toshiyuki2 (1.Univ. of Yamanashi, 2.SST Inc)

Keywords:ReRAM,WO3,plasma