[14a-A28-1~10] 8.1 Plasma production and control

[14a-A28-10] Analysis of Heat Flux at Substrate for Control of Substrate Temperature during Plasma Processing

〇(DC)Takayoshi Tutumi¹, Yusuke Fukunaga¹, Kenji Ishikawa¹, Keigo Takeda¹, Hiroki Kondo¹, Takayuki Ohta², Masafumi Ito², Makoto Sekine¹, Masaru Hori¹ (1.Nagoya Univ., 2.Meijo Univ.)

Keywords:substrate temperature,heat flux,plasma