[14a-A29-1~11] 13.4 Si wafer processing /MEMS/Integration technology

[14a-A29-3] Small-grain titanium nitride film with high work-function by plasma treatment

〇Motomu Degai¹, Masanori Nakayama¹, Kazuhiro Harada¹, Hiroshi Ashihara¹, Keniji Kanayama¹ (1.Hitachi Kokusai Electric)

Keywords:wiring,plasma,work function