The 62nd JSAP Spring Meeting, 2015

Presentation information

Oral presentation

13 Semiconductors » 13.4 Si wafer processing /MEMS/Integration technology

[14a-A29-1~11] 13.4 Si wafer processing /MEMS/Integration technology

Sat. Mar 14, 2015 9:00 AM - 12:00 PM A29 (6A-204)

9:30 AM - 9:45 AM

[14a-A29-3] Small-grain titanium nitride film with high work-function by plasma treatment

〇Motomu Degai1, Masanori Nakayama1, Kazuhiro Harada1, Hiroshi Ashihara1, Keniji Kanayama1 (1.Hitachi Kokusai Electric)

Keywords:wiring,plasma,work function