The 62nd JSAP Spring Meeting, 2015

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7 Beam Technology and Nanofabrication » 7.6 Ion beams

[14a-C1-1~11] 7.6 Ion beams

Sat. Mar 14, 2015 9:00 AM - 12:00 PM C1 (6C-104)

11:00 AM - 11:15 AM

[14a-C1-8] Fine patterns etching with ClF3 neutral cluster beam

〇Toshio Seki1, Hiroki Yamamoto2, Takahiro Kozawa2, Yu Yoshino3, Takehiko Senoo3, Kunihiko Koike3, Takaaki Aoki1, Jiro Matsuo1 (1.Kyoto Univ., 2.ISIR Osaka Univ., 3.Iwatani Corp.)

Keywords:cluster,neutral beam