[14a-D1-1~9] Joint Session K

[14a-D1-8] Fabrication of ZnO thin film by mist CVD method using molecular precursor solution

〇(M1)Ryosuke Goto¹, Hayato Shibuki¹, Keisuke Tanuma¹, Takumi Hatakeyama¹, Hiroki Nagai¹, Tomohiro Yamaguchi¹, Mitsunobu Sato¹, Tohru Honda¹ (1.Kogakuin Univ.)

Keywords:ZnO,transparent conducting oxide,mist CVD