[14p-A29-1~8] 13.4 Si wafer processing /MEMS/Integration technology

[14p-A29-2] Improvement in Thermal Uniformity of a Half-inch Wafer in Minimal Focused Light Heating Furnace (II)

〇Noriko Miura¹, Takeshi Aizawa^{1, 2}, Takeshi Yamada^{1, 2}, Takahiro Ito^{1, 3}, Haruki Toonoe¹, Shinichi Ikeda^{1, 4}, Yuuki Ishida^{1, 4}, Takanori Mikahara¹, Yasuhiro Onishi^{1, 2}, Sommawan Khumpuang^{1, 4}, Shiro Hara^{1, 4} (1.MINIMAL, 2.YONEKURA, 3.ORIENTAL MOTER, 4.AIST)

Keywords:minimal,thermal oxidation,furnace