atsuhiro yamada

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Speaker, Author, Co-Author

Wed. Sep 14, 2016 1:30 PM - 3:30 PM P5 (Exhibition Hall)

Poster presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[14p-P5-1~13] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

1:30 PM - 3:30 PM

[14p-P5-11] Study on diffusion path and energy barrier of metal atoms near dopant atom in Si by first-principles calculatio

〇(M2)atsuhiro yamada¹, koji sueoka¹ (1.Okayama Pref Univ.)