kohei shioda

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Speaker, Author, Co-Author

Thu. Sep 15, 2016 9:00 AM - 12:15 PM C302 (Nikko Houou)

Oral presentation
| 15 Crystal Engineering
| 15.6 Group IV Compound Semiconductors (SiC)

[15a-C302-1~12] 15.6 Group IV Compound Semiconductors (SiC)

11:00 AM - 11:15 AM

[15a-C302-8] Development of SiC Epitaxial Reactor Cleaning Process Using Chlorine Trifluoride Gas-Evaluation of Pyrolytic Carbon as Susceptor Coating Material-

〇kohei shioda¹, hitoshi habuka¹, hideki ito², shin-ichi mitani³, yoshinao yakahashi³ (1.Yokohama Nat.Univ, 2.NuFlare Technology, 3.Kanto Denka Kogyo)