Takashi Onaya

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Speaker, Author, Co-Author

Thu. Sep 15, 2016 10:15 AM - 11:45 AM B9 (Exhibition Hall)

Oral presentation
| 13 Semiconductors
| 13.3 Insulator technology

[15a-B9-1~6] 13.3 Insulator technology

10:15 AM - 10:30 AM

△ [15a-B9-1] Role of high-k interlayer on characteristics for DRAM capacitors with ZrO₂/high-k/ZrO₂ insulating multilayer

〇(M1)Takashi Onaya^1,2, Toshihide Nabatame^2,3, Tomomi Sawada^2,3, Kazunori Kurishima^1,2, Naomi Sawamoto¹, Akihiko Ohi², Toyohiro Chikyo², Atsushi Ogura¹ (1.Meiji Univ., 2.NIMS WPI-MANA, 3.JST-CREST)