Madoka Kato

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Speaker, Author, Co-Author

Fri. Sep 16, 2016 9:00 AM - 11:45 AM D61 (Bandaijima Bldg.)

Oral presentation
| 15 Crystal Engineering
| 15.5 Group IV crystals and alloys

[16a-D61-1~11] 15.5 Group IV crystals and alloys

10:00 AM - 10:15 AM

[16a-D61-5] Effects of ion implantation on strain relaxation of SiGe films on Si(110) substrates

〇Madoka Kato¹, Taiyo Murakami², Keisuke Arimoto², Junji Yamanaka², Kiyokazu Nakagawa², Kentaro Sawano¹ (1.Tokyo City Univ., 2.Univ. of Yamanashi)