The 77th JSAP Autumn Meeting, 2016

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

[13a-A31-1~11] 6.3 Oxide electronics

Tue. Sep 13, 2016 9:00 AM - 11:45 AM A31 (302A)

Takayoshi Katase(Hokkaido Univ.)

10:00 AM - 10:15 AM

[13a-A31-5] Formation of Separate Phonon by Local Impurity Doping to VO2 Thin Films

Takeaki Yajima1, Tomonori Nishimura1, Akira Toriumi1 (1.The Univ. of Tokyo)

Keywords:metal-insulator transition, Raman spectroscopy

In a typical metal-insulator transition material, VO2, the local impurity doping resulted in the phonon which was seperated from the surrounding non-doped region. This result indicates a relatively weak phonon coupling between different resions across the interface, providing critical information for designing nanodevices with metal-insulator transition materials.