[13p-C31-1~11] 7.1 X-ray technologies

[13p-C31-2] Development of Cr/Sc/Mo multilayer reflector for grazing incidence mirrors working at 4.0 nm wavelength

〇Tadashi Hatano¹, Takeo Ejima¹ (1.IMRAM, Tohoku Univ.)

Keywords:multilayer, reflectance, soft X-ray

Multilayer reflector for grazing incidence mirrors used in laboratory soft X-ray microscopes working at 4 nm wavelength is under development. At the last meeting we reported a 20 period Cr/Sc multilayer which came off the substrate after deposition. To decrease stress of Sc layers, we have designed a new multilayer structure Cr/Sc/Mo. The measured reflectance of 10 periods deposited on a Si wafer was 27%. The multilayer deposited on a concave substrate has not come off.