The 77th JSAP Autumn Meeting, 2016

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.4 Thin films and New materials

[13p-D62-1~14] 6.4 Thin films and New materials

Tue. Sep 13, 2016 1:45 PM - 5:30 PM D62 (Bandaijima Bldg.)

Tetsuo Tsuchiya(AIST), Masami Nishikawa(Nagaoka Univ. of Tech.)

2:30 PM - 2:45 PM

[13p-D62-4] Observation of RHEED oscillation of Fe3-xO4 (001) thin films deposited by reactive sputtering technique

Taisuke Ojima1, Tainosho Takeshi1, Sonia Sharmin1, 〇Hideto Yanagihara1 (1.Univ. Tsukuba)

Keywords:reactive sputtering, RHEED, layer-by-layer growth

Atomically flat Fe3-xO4 (001) (x=0, 0.33) epitaxial films with magnetic properties as good as the bulk ones can be grown by reactive magnetron sputtering technique. We have observed in situ RHEED oscillations during Fe3-xO4 (001) thin-film growth process by reactive magnetron sputtering. The oscillation period corresponds to the thickness of single layer molecule of Fe3-xO4 stacking on (001) planes.