[14a-A23-1~10] 6.1 Ferroelectric thin films

[14a-A23-4] Electric field induced change of the crystal structure in YO_1.5-HfO₂ thin film

〇Takao Shimizu¹, Takanori Mimura¹, Kiliha Katayama¹, Takanori Kiguchi², Akihiro Akama², Toyohiko Konno², Osami Sakata³, Hiroshi Funakubo¹ (1.Tokyo Inst. Tech., 2.Tohoku Univ., 3.NIMS)

Keywords:ferroelectrics, Hafnium oxide, Micro area X-ray diffraction