[14a-C31-1~10] 3.7 Laser processing

[14a-C31-9] Formation of periodic micro/nanostructure onto aluminum thin film by vacuum UV laser

〇Ryota Matsunaga¹ (1.N.D.A)

Keywords:ArF excimer laser, aluminum thin film, periodic micro/nanostructure

Silica glass microspheres 2.5 micron in diameter was aligned into single layer on approximately 20 nm thick aluminum thin film surface was vacuum-evaporated on silicone rubber surface, then exposured by 193 nm ArF excimer laser at single-pulse fluence of 10 mJ/cm², the pulse repetition rate was 1 Hz and the irradiation time was varied from 15 to 60 min. As a result, pillar-shaped structure was confirmed under the aluminum thin film surface during the ArF laser irradiation, of which also found to be periodical at regular intervals of approximately 1 micron in diameter and from 3 to 5 micron in height.