The 77th JSAP Autumn Meeting, 2016

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Oral presentation

7 Beam Technology and Nanofabrication » 7.5 Ion beams

[14p-B6-1~12] 7.5 Ion beams

Wed. Sep 14, 2016 1:45 PM - 5:15 PM B6 (Exhibition Hall)

Yasuhito Gotoh(Kyoto Univ.), Satoshi Ninomiya(Yamanashi Univ.)

1:45 PM - 2:15 PM

[14p-B6-1] [INVITED] Recent Progress in Cluster Ion Beam: from Semiconductors to Soft Materials

〇Jiro Matsuo1 (1.QSEC, Kyoto University)

Keywords:Cluster, Surface, Collision

A method for generating large cluster has been developed at Kyoto University. Since then, much attention is now devoted to studying gas cluster ion beams (GCIB) not only for fundamental research but also for practical applications. Cluster ion beams have been utilized for advanced nanofabrication and characterization technique, because of the unique interactions of energetic cluster ions with solid surfaces. Recent progress and prospects of cluster beams will be discussed in conjunction with the atomistic mechanism of energetic cluster impacts and possible applications.