The 77th JSAP Autumn Meeting, 2016

Presentation information

Oral presentation

15 Crystal Engineering » 15.6 Group IV Compound Semiconductors (SiC)

[15a-C302-1~12] 15.6 Group IV Compound Semiconductors (SiC)

Thu. Sep 15, 2016 9:00 AM - 12:15 PM C302 (Nikko Houou)

Tomohisa Kato(AIST)

9:15 AM - 9:30 AM

[15a-C302-2] Time dependence of the meniscus height for solution growth of SiC crystal by X-ray transmission method

Takenobu Sakai1, Motohisa Kado2, Hironori Daikoku2, Shunta Harada3, Toru Ujihara3 (1.Nagoya Univ. Inst. of Innov. for Futur. Soc., 2.Toyota Motor Co., 3.Nagoya Univ. Inst. of Mat. and Sys. for Sust.)

Keywords:solution growth of SiC crystal, In-situ observation

Top seeded solution growth is greater technique der the possibility of realizing a high-quality SiC bulk crystal. However, it is difficult to know such as the state of contact between the solution and the seed crystal, because of the crystal growth at high-temperature range. We need to know the physical state of the field of crystal growth. In this paper, we review our developed in-situ observation techniques and the study about the observation of the time-dependency of the meniscus height.Then, during the growth of 24 hours, the meniscus height was found to increase 3.5~5mm.