The 77th JSAP Autumn Meeting, 2016

Presentation information

Oral presentation

Joint Session K "Wide bandgap oxide semiconductor materials and devices" » Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[15p-A22-1~17] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

Thu. Sep 15, 2016 1:30 PM - 6:00 PM A22 (Main Hall B)

Yasuaki Ishikawa(NAIST), Mamoru Furuta(Kochi Univ. of Tech.)

2:00 PM - 2:15 PM

[15p-A22-3] Dependence of photoinduced top-gate effect in a-InGaZnO TFTs on a-InGaZnO thickness

Kazushige Takechi1, Hiroshi Tanabe1 (1.NLT Technologies)

Keywords:oxide semiconductor, thin-film transistor, photoinduced top-gate effect

We found that the photoinduced (blue LED) top-gate effect in bottom-gate type a-InGaZnO TFTs depends on the thickness of a-InGaZnO layer as well as the magnitude of negative Vtg. This specific feature of a-InGaZnO TFTs is interesting from the viewpoints of not only TFT application to a photosensor but also device physics.