[15p-B5-1~19] 7.2 Applications and technologies of electron beams

[15p-B5-11] Fabrication of Spindt-type Field Emitter Arrays by Minimal Lithography System

〇Masayoshi Nagao¹, Noriyuki Tatsumi¹, Katsuhisa Murakami¹, Sommawan Khumpuang^1,2, Shiro Hara^1,2, Yasuhito Gotoh³ (1.AIST, 2.Minimal, 3.Kyoto Univ.)

Keywords:field emitter array, image sensor, minimal fab

We are developing matrix driven field emitter arrays for radiation tolerant image sensor. We have already reported a built-in focusing electrode to achieve a fine pitch pixel, such as 50 microns, and also reported high radiation tolerance more than 1 MGy. In this paper, we will report on the fabrication of volcano-structured Spindt-type FEA using "Minimal Lithography System" that requires no clean room and, therefore, is suitable for manufacturing small quantity device.