2:30 PM - 2:45 PM
[15p-B8-5] Study on Si Optical Modulator, Using Strained SiGe Layer with in-situ B doping (Ⅱ)
Keywords:silicon optical modulator, strained silicon germanium
We have successfully demonstrated design and fabricate the optimum Si-MOD structure by applying in-situ p-type-doped strained SiGe during deposition on the lateral pn junction structure of a Si rib waveguide and demonstrate a very a high modulation efficiency of 0.60-0.67 Vcm at a 1.3 um wavelength. We have also demonstrated a high speed operation of 28 Gbps.