[15p-P15-1~8] 6.5 Surface Physics, Vacuum

[15p-P15-4] Study on adsorption reaction of CH₃Cl on Si(100)2×1 by means of SR-XPS

〇Chie Tsukada¹, Hikaru Yoshida¹, Michio Okada², Akitaka Yoshigoe¹, Tsuyoshi Yaita¹ (1.JAEA, 2.Osaka Univ.)

Keywords:Si(100)2x1, CH3Cl, adsorption reaction

Cs in clay mineral will be easy to desorb as halide. We should investigate the desorption mechanism. The clay mineral is constructed mainly by oxide with Si and Al. Thus, Si substrate and CH₃Cl are selected as the reaction model materials. The final purpose is to reveal the reaction for CH₃Cl molecular beam on Cs/Si substrate by means of XPS with synchrotron radiation (SR-XPS). As the first step, the purpose in this study is to reveal the adsorption reaction for CH₃Cl molecular beam on Si(100)2x1 by means of SR-XPS. The CH₃Cl will adsorb at CH₃ and/or Cl group on the Si dimer atom, respectively.