The 77th JSAP Autumn Meeting, 2016

Presentation information

Oral presentation

15 Crystal Engineering » 15.3 III-V-group epitaxial crystals, Fundamentals of epitaxy

[16a-B9-1~15] 15.3 III-V-group epitaxial crystals, Fundamentals of epitaxy

Fri. Sep 16, 2016 9:00 AM - 1:00 PM B9 (Exhibition Hall)

Tomoya Konishi(Natl. Inst. of Tech.,Anan Col.), Kohei Miura(Sumitomo Electric)

9:45 AM - 10:00 AM

[16a-B9-4] Characterization of GaSb layers grown by MBE on InP substrates

Yuichi Kawamura1, fengquan Shi1, Kohei Miura2, Yasuhiro Iguchi2 (1.Osaka Pref. Univ., 2.Sumitomo elec. Ltd.)

Keywords:compound semiconductor

Type-II InAs/GaSb superlattices (SLs) are attractive material systems for mid-infrared photodiodes (PDs) with higher detectivities. GaSb substrates are generally used for the epitaxial growth of these type-II SLs. However, in the case of back-illuminated PDs, the GaSb substrate should be nearly removed because of its strong absorption of mid-infrared light. Recenty, InAs/GaSb SLs PDs grown on an InP substrate were fabricated by our group. In this study,
characterization of GaSb layers grown on InP substrate with various growth condition were carried out.