[16a-P5-1~32] 15.4 III-V-group nitride crystals

△ [16a-P5-29] Deposition of GaN thin films by sputtering using Ga metal target or GaN target

〇Ryo Ishikawa¹, Yuji Isosaki¹, Yuichiro Yamashita², Takashi Yagi², Junjun Jia¹, Naoyuki Taketoshi², Shin-ichi Nakamura¹, Yuzo Shigesato¹ (1.AoyamaGakuin Univ., 2.AIST)

Keywords:gallium nitride, sputtering, semiconductor