The 77th JSAP Autumn Meeting, 2016

Presentation information

Oral presentation

16 Amorphous and Microcrystalline Materials » 16.3 Bulk, thin-film and other silicon-based solar cells

[16p-A24-1~11] 16.3 Bulk, thin-film and other silicon-based solar cells

Fri. Sep 16, 2016 1:15 PM - 4:15 PM A24 (201A)

Keisuke Ohdaira(JAIST), Hitoshi Sai(AIST)

1:45 PM - 2:00 PM

[16p-A24-3] Front Side Improvement for n-PERT Solar Cell by Removing the Boron-depleted Region

SIMAYI SHALAMUJIANG1, Yasuhiro Kida1, Katsuhiko Shirasawa1, Tatsunobu Suzuki2, Hidetaka Takato1 (1.FREA, AIST, 2.Nippon Kasei Chemical Co., Ltd.)

Keywords:bifacial solar cell, , boron depleted region, spin etching

In this study, an important step was made toward improving the front-side emitter of n-type bifacial solar cells. An improved boron profile was obtained by etching the surface by 0.15 um. This resulted in a boron emitter without boron depletion at the surface. The measured Jsc from the I-V parameters implies that removing the depleted region by means of spin etching technique on the wafer surface exhibit a less damage to the pyramid textures on the wafer surface. The J0e values were measured on a symmetrical p+/n/p+ samples for these non-etched and etched emitters. J0e value improved from 121 fA/cm2 to 103 fA/cm2 by removing the depleted region. This improvement in J0e resulted in a 3.5 mV increase in Voc. The other main difference was observed in FF. The FF was 1.8% lower in the case of cells in which the boron-depleted region was not etched.