Development of the photosensitive surfaces,<br />and the resist-free fine wiring forming technique using an electro less plating.

Yusuke Kawakami; Shohei Koizumi; Masakazu Hori; Yosuke Hayashida; Yoshiaki Kito

1:30 PM - 3:30 PM

[16p-P7-9] Development of the photosensitive surfaces,
and the resist-free fine wiring forming technique using an electro less plating.

〇Yusuke Kawakami¹, Shohei Koizumi¹, Masakazu Hori¹, Yosuke Hayashida¹, Yoshiaki Kito¹ (1.Nikon)

Keywords:Photo patterning, Wiring formation, Photoreactive surface modification

We have synthesized a photoresponsive material suitable for wiring plating. As a result of verifying the application to the wiring plating, it was express the desired selectivity performance in several nm thin film formed on a flexible PET substrate, without using a photo resist. It was confirmed that it is possible to fine plated formation with photolitho technique.

Presentation information

[16p-P7-1~20] 12.4 Organic light-emitting devices and organic transistors

[16p-P7-9] Development of the photosensitive surfaces,
and the resist-free fine wiring forming technique using an electro less plating.

Presentation information

[16p-P7-1~20] 12.4 Organic light-emitting devices and organic transistors

[16p-P7-9] Development of the photosensitive surfaces,and the resist-free fine wiring forming technique using an electro less plating.

[16p-P7-9] Development of the photosensitive surfaces,
and the resist-free fine wiring forming technique using an electro less plating.