NING LI

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Speaker, Author, Co-Author

Sat. Mar 19, 2016 9:00 AM - 12:30 PM S423 (S4)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[19a-S423-1~13] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

11:00 AM - 11:15 AM

[19a-S423-8] Half-Inch Silicon CVD Reactor Using Concentrated Infrared Light Heater (6)

〇NING LI¹, HITOSHI HABUKA¹, TAKANORI MIKAHARA², SHIN-ICHI IKEDA^2,3, YUUKI ISHIDA^2,3, SHIRO HARA^2,3 (1.Yokohama National Univ., 2.MINIMAL, 3.AIST)