HIDEHIKO OKUDA

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Speaker, Author, Co-Author

Sun. Mar 20, 2016 2:15 PM - 5:45 PM H113 (H)

Oral presentation
| 15 Crystal Engineering
| 15.8 Crystal evaluation, impurities and crystal defects

[20p-H113-1~13] 15.8 Crystal evaluation, impurities and crystal defects

2:45 PM - 3:00 PM

[20p-H113-3] Characteristic of Carbon Cluster Ion Implanted Epitaxial Silicon Wafers (3)
- Trapping Effect of Oxygen -

〇HIDEHIKO OKUDA¹, RYOU HIROSE¹, AYUMI MASADA¹, TAKESHI KADONO¹, RYOUSUKE OKUYAMA¹, YOSHIHIRO KOGA¹, KAZUNARI KURITA¹ (1.SUMCO CORPORATION)