Toshio Seki

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Speaker, Author, Co-Author

Sun. Mar 20, 2016 1:15 PM - 5:15 PM H137 (H)

Oral presentation
| 7 Beam Technology and Nanofabrication
| 7.5 Ion beams

[20p-H137-1~15] 7.5 Ion beams

4:45 PM - 5:00 PM

[20p-H137-14] Reactive etching by ClF₃-Ar neutral cluster beam with scanning

〇Toshio Seki¹, Yu Yoshino², Kunihiko Koike², Takaaki Aoki¹, Jiro Matsuo¹ (1.Kyoto Univ., 2.Iwatani Corp.)