Kenji Ishikawa

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Speaker, Author, Co-Author

Sat. Mar 19, 2016 2:30 PM - 5:45 PM W621 (W6)

Oral presentation
| 8 Plasma Electronics
| 8.4 Plasma etching

[19p-W621-1~12] 8.4 Plasma etching

2:30 PM - 2:45 PM

[19p-W621-1] Transport mechanism on reactive species in down-flow reactors for F-based Si etch

〇Kenji Ishikawa¹, Makoto Sekine¹, Toshio Hayashi¹, Masaru Hori¹, Yasuhiro Horiike² (1.Nagoya University, 2.Tsukuba University)