[20a-S222-1~11] 21.1 Joint Session K

Sun. Mar 20, 2016 9:00 AM - 12:00 PM S222 (S2)

Tomoki Abe(Tottori Univ.)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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9:00 AM - 9:15 AM

△ [20a-S222-1] Clarification of the growth factors of Ga-doped ZnO films by ion-plating with dc arc discharge: Quantitative analysis of flying particles

〇Hisashi Kitami¹, Toshiyuki Sakemi¹, Junichi Nomoto², Hisao Makino^2,3, Yasushi Aoki¹, Takanori Kato¹, Tetsuya Yamamoto² (1.SHI, 2.Research Inst., Kochi Univ. Tech., 3.Kochi Univ. Tech.)

9:15 AM - 9:30 AM

[20a-S222-2] Control of hydrogen gas spillover to improve a response time of hydrogen gas sensor based on conductive Ga-doped ZnO films as sensing materials

〇Tetsuya Yamamoto¹, Junichi Nomoto¹, Hisao Makino¹, Seiichi Kishimoto² (1.Res. Inst., Kochi Univ. Tech., 2.Kochi Nat. Coll. Tech.)

9:30 AM - 9:45 AM

[20a-S222-3] Study on carrier generation mechanism in V-doped ZnO

〇Tomoyuki Kawashima¹, Dai Abe¹, Katsuyoshi Washio¹ (1.Tohoku Univ.)

9:45 AM - 10:00 AM

[20a-S222-4] Thermal stability of Ti-doped ZnO transparent conductive films deposited by DC magnetron sputtering method

Toshiki Kitao¹, 〇Hisao Makino^1,2, Nomoto Junichi², Yamamoto Tetsuyta², Kunihiko Nakata³ (1.Kochi Univ. of Tech., 2.Res.Inst. Kochi Univ. of Tech., 3.Sumitomo-Chem.)

10:00 AM - 10:15 AM

[20a-S222-5] Influence of grain boundary on carrier transport in polycrystalline transparent conducting Al-doped ZnO thin films (Ⅲ)

〇ryousuke uozaki¹, kyousuke watanabe¹, noriaki ikenaga¹, toshihiro miyata¹, tadatsugu minami¹ (1.OEDS R&D Center, K I T)

10:15 AM - 10:30 AM

[20a-S222-6] The influence of Al contents on the properties of orientation distribution and carrier transport of polycrystalline transparent conductive Al-doped ZnO films by direct current magnetron sputtering

〇Junichi Nomoto¹, Hisao Makino^1,2, Tetsuya Yamamoto¹ (1.Research Inst., Kochi Univ. Tech., 2.Kochi Univ. Tech.)

10:45 AM - 11:00 AM

△ [20a-S222-7] Transparent conductive ITO and IZO films deposited by reactive sputtering with plasma emission feedback system

〇Yusuke Miyazaki¹, Eri Maruyama¹, Junjun Jia¹, Hironobu Machinaga², Tsukasa Miyazaki², Yuzo Shigesato¹ (1.Aoyama Gakuin Univ., 2.Nitto Denko Co.)

11:00 AM - 11:15 AM

[20a-S222-8] The development of ITO nanoparticles TCF using mist deposition method

〇Makoto Nakazumi¹, Yasutaka Nishi¹, Kei Nara¹, Koichiro Iwahori¹ (1.Nikon)

11:15 AM - 11:30 AM

[20a-S222-9] Growth and Magnetic characteristics of Dy-doped metal oxide nanoparticles

〇(M1)Masaharu Nishioka¹, Yukiyasu Kashiwagi², Masashi Saitoh², Masami Nakamoto², Yi-Kai Zhou³, Bao LIU³, CUI Xing-Heng³, Ryouya Oota¹, Akira Fujimoto¹, Yoshiyuki Harada¹, Tomosumi Kamimura¹ (1.OIT, 2.OMTRI, 3.Shanghai Normal Univ.)

11:30 AM - 11:45 AM

[20a-S222-10] Effect of Al doping in the Ag thin layer of AMZO/Ag(Al)/AMZO-DMD

〇Kanae Igarashi¹, Yukiko Sugimoto¹, Akihiko Kikuchi^1,2 (1.Sophia Univ., 2.Sophia Nanotech CNTR)

11:45 AM - 12:00 PM

[20a-S222-11] Hetero-epitaxial growth of rhombohedral ITO thin films by mist CVD method

〇HIROYUKI NISHINAKA¹, MASAHIRO YOSHIMOTO¹ (1.Kyoto Inst. of Tech.)

Session information