Poster presentation

6 Thin Films and Surfaces » 6.4 Thin films and New materials

[22a-P5-1~18] 6.4 Thin films and New materials

Tue. Mar 22, 2016 9:30 AM - 11:30 AM P5 (Gymnasium)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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9:30 AM - 11:30 AM

[22a-P5-1] Growth of hcp-Ni thin films and its thermal anneal

〇Takumi Ikenoue¹, Masaki Ueno¹, Sachio Komori², Itsuhiro Kakeya², Masao Miyake¹, Tetsuji Hirato¹ (1.Kyoto Univ. Energy, 2.Kyoto Univ. Eng.)

9:30 AM - 11:30 AM

[22a-P5-2] Magneto-anisotropy of epitaxial SmFe₇ and SmFe₇N_x films

〇Takeshi Kusumori¹, Asaya Fujita¹, Kimihiro Ozaki¹ (1.AIST)

9:30 AM - 11:30 AM

[22a-P5-3] Magnetism on nickel ultrathin film on palladium (001) surface

〇(M1)Shohei Arimoto¹, Peter Krueger¹ (1.Chiba Univ.)

9:30 AM - 11:30 AM

[22a-P5-4] Improvement of deposition rate control and analysis of crystal structure of [(CaFeOx)n/(LaFeO3)n]m {m=14 for n=3,5,7 and (n,m)=(1,98),(3,33),(5,20)} artificial superlattices

〇Shohei Ohashi¹, Keisuke Oshima¹, Hirotaka Matsuyama¹, Takaaki Inaba¹, Yuta Watabe¹, Chun Wang¹, Qi Zhang¹, Huaping Song¹, Takuya Hashimoto², Koichi Takase¹, Tomoko Nagata¹, Hiroshi Yamamoto¹, Nobuyuki Iwata¹ (1.CST, Nihon Univ., 2.CHS, Nihon Univ.)

9:30 AM - 11:30 AM

[22a-P5-5] Mechanism of Electrical Conduction for MoSi2-Si Composite Thin Film

〇kousuke shimozono¹, Ryosuke Kitani¹, Yuuki Sato¹, Yoshikado Shinzo¹ (1.Doshisha Univ.)

9:30 AM - 11:30 AM

[22a-P5-6] Fabrication and characterization of self-assembled monolayer with octadecylphosphonic acid

〇toshiya Banba¹, Heng Yong Nie², Shin-ichi Yamamoto¹ (1.Ryukoku Univ., 2.Univ. of Western Ontario)

9:30 AM - 11:30 AM

[22a-P5-7] Evaluation of Conductivity in Oxide Thin Films Using AC Impedance Method

〇(B)Masahito Yamaguchi¹, Takaaki Inoue¹, Tomoya Sato¹, Kiyoshi Uchiyama¹ (1.NIT, Tsuruoka College)

9:30 AM - 11:30 AM

[22a-P5-8] Microstructural control of LaNiO₃ thin films deposited by spin-coating method

〇(B)Yoshiro Kumagai¹, Kiyoshi Uchiyama¹ (1.NIT, Tsuruoka College)

9:30 AM - 11:30 AM

[22a-P5-9] Nb:TiO₂/SUS304 structure formed by atmospheric chemical vapor deposition technique

〇Tsuyoshi Kikuta¹, Kobayashi Nozomi¹, Komatsu Keiji¹, Saitoh Hidetoshi¹ (1.Nagaoka Univ. Tech.)

9:30 AM - 11:30 AM

[22a-P5-10] Preparation of BiVO₄ thin films by RF magnetron sputtering method

〇toshiya Banba¹, Takuto Ouruma¹, Mikihiko Nishitani², Shin-Ichi Yamamoto¹ (1.Ryukoku Univ., 2.Osaka Univ.)

9:30 AM - 11:30 AM

[22a-P5-11] Characterization on type II Si clathrate film with HF treatment

〇Kazutoshi Urano¹, Kouki Uehara¹, Tomoki Asano¹, Fumitaka Oohashi¹, Tetuji Kume¹, Takayuki Ban¹, Shuichi Nonomura¹ (1.Gifu Univ.)

9:30 AM - 11:30 AM

[22a-P5-12] Reactive Stabilities of TiO₂/Cu₂O photocathodes for reduction of H₂O

〇Masami Nishikawa¹, Masayuki Fukuda¹, Yoshio Nosaka¹, Tomohiko Nakajima², Tetsuo Tsuchiya², Nobuo Saito¹ (1.Nagaoka Univ. of Tech., 2.AIST)

9:30 AM - 11:30 AM

[22a-P5-13] Fabrication of IGZO Thin Films by RF Sputtering and their TFT Applications

〇(B)Takanori Takahashi¹, Keisuke Kadowaki¹, Tomoya Sato¹, Takaaki Inoue¹, Yoshiro Kumagai¹, Takeshi Hoga¹, Kiyoshi Uchiyama¹ (1.NIT, Tsuruoka College)

9:30 AM - 11:30 AM

[22a-P5-14] Evaluation of the Mn-doped ZnO thin film prepared by magnetron sputtering

〇Naoki Minowa¹, Nao Nasu¹, Yu Zhang¹, Xinwei Zhao¹ (1.Tokyo Univ.of Sci)

9:30 AM - 11:30 AM

[22a-P5-15] Low-Temperature Fabrication of Silicon Dioxide Thin Films by Mist-CVD Method

〇Shigetaka Katori¹, Kouki Hiramatsu¹, Masanori Nagahata¹, Masaya Oda², Toshimi Hitora² (1.NIT, Tsuyama Coll., 2.Flosfia Inc.)

9:30 AM - 11:30 AM

[22a-P5-16] Tin oxide thin films deposited with a non-equilibrium 2-dimentional plasma under N₂/O₂ gas flowing

〇Kento Horimizu¹, Syota Kanezashi¹, Yuki Masuda¹, Masayuki Okuya^1,2 (1.Grad.School Eng., Shizuoka Univ., 2.Res.Inst.Green Sci.Tech., Shizuoka Univ.)

9:30 AM - 11:30 AM

[22a-P5-17] Fabrication of Porous Oxide Films by Aerosol Deposition

〇(B)Takaaki Inoue¹, Yasunori Shito¹, Tomoya Sato¹, Jun Akedo², Kiyoshi Uchiyama¹ (1.NIT, Tsuruoka College, 2.AIST)

9:30 AM - 11:30 AM

[22a-P5-18] Cross-sectional observation of Y₂O₃ and Er₂O₃ films deposited by chelate flame method

〇YanXin Dan¹, Atsushi Nakamura^1,2, Keiji Komatsu¹, Hidetoshi Saitoh¹ (1.Nagaoka Univ. Tech., 2.Chubu Chelest)

Session information

[22a-P5-1~18] 6.4 Thin films and New materials

[22a-P5-1] Growth of hcp-Ni thin films and its thermal anneal

[22a-P5-2] Magneto-anisotropy of epitaxial SmFe₇ and SmFe₇N_x films

[22a-P5-3] Magnetism on nickel ultrathin film on palladium (001) surface

[22a-P5-4] Improvement of deposition rate control and analysis of crystal structure of [(CaFeOx)n/(LaFeO3)n]m {m=14 for n=3,5,7 and (n,m)=(1,98),(3,33),(5,20)} artificial superlattices

[22a-P5-5] Mechanism of Electrical Conduction for MoSi2-Si Composite Thin Film

[22a-P5-6] Fabrication and characterization of self-assembled monolayer with octadecylphosphonic acid

[22a-P5-7] Evaluation of Conductivity in Oxide Thin Films Using AC Impedance Method

[22a-P5-8] Microstructural control of LaNiO₃ thin films deposited by spin-coating method

[22a-P5-9] Nb:TiO₂/SUS304 structure formed by atmospheric chemical vapor deposition technique

[22a-P5-10] Preparation of BiVO₄ thin films by RF magnetron sputtering method

[22a-P5-11] Characterization on type II Si clathrate film with HF treatment

[22a-P5-12] Reactive Stabilities of TiO₂/Cu₂O photocathodes for reduction of H₂O

[22a-P5-13] Fabrication of IGZO Thin Films by RF Sputtering and their TFT Applications

[22a-P5-14] Evaluation of the Mn-doped ZnO thin film prepared by magnetron sputtering

[22a-P5-15] Low-Temperature Fabrication of Silicon Dioxide Thin Films by Mist-CVD Method

[22a-P5-16] Tin oxide thin films deposited with a non-equilibrium 2-dimentional plasma under N₂/O₂ gas flowing

[22a-P5-17] Fabrication of Porous Oxide Films by Aerosol Deposition

[22a-P5-18] Cross-sectional observation of Y₂O₃ and Er₂O₃ films deposited by chelate flame method

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