[19a-P1-1~17] 7 Beam Technology and Nanofabrication（Poster）

[19a-P1-8] Interfacial band offset analysis of TaO_x nanosheet/SiO₂/Si by surface charge-switched x-ray photoelectron spectroscopy

〇(B)Shuhei Hayami¹, Satoshi Toyoda¹, Katsutoshi Fukuda¹, Hidetaka Sugaya¹, Akiyoshi Nakata¹, Masashi Morita¹, Yoshiharu Uchimoto¹, Eiichirou Matsubara¹ (1.Kyoto Univ.)

Keywords:nanosheet,X-ray Photoerectron Spectroscopy,band offset