[19a-P2-1~24] 12.1 Fabrications and Structure Controls

[19a-P2-10] Fabrication of HC(NH₂)₂PbI₃ Films Using Vacuum Deposition

Tsuyoshi Kajikawa¹, Terunao Matsumoto², Yuuki Matsuoka², 〇Senku Tanaka² (1.Kinki Univ. Grad. Sch., 2.Kinki Univ.)

Keywords:Organolead halide perovskites,vacuum deposition

The organolead halide perovskite films are fabricated by mainly two methods. One is solution processing method and the other is vacuum deposition method. Vacuum deposition has advantages for avoiding contaminations and controlling film structures, although is costly as compared with the solution process. In this study, HC(NH₂)₂PbI₃ thin films were fabricated by vacuum deposition method. Lead halide and formamidine hydroiodide (FAI) were co-deposited on a glass substrate with 1:20 ratio of the deposition rate. The substrate temperature was set to 80 C to promote a uniformity of the perovskite films. It is important to control both of the deposition rate and the substrate temperature for making a good quality films by vacuum deposition.