[19p-H111-1~22] 6.3 Oxide electronics

[19p-H111-15] Electrochemical Property and Morphology of Ta₂O₅ Solid Electrolyte Thin Films

〇Ayuko Imai¹, Sanae Furuya¹, Ken Sumiyoshi¹ (1.NLT Technologies)

Keywords:solid electrolyte,tantalum oxide,sputtering

WO₃/Ta₂O₅ stack films were prepared on ITO glasses by sputtering deposition. Sputtering pressure conditions and post-heating procedures can control the proton-injection properties in diluted sulfuric acid. The film morphologies and void fraction were determined from AFM images and spectroscopic ellipsometry. All the experimental results suggest low density films are suitable for protonic conductors.