[19p-P6-1~8] 8.3 Deposition of thin film and surface treatment

[19p-P6-1] Preparation of Functional Thin Films by Backside Powder Target PLD Method

〇Hiroharu Kawasaki¹, Tamiko Ohshima¹, Yoshihito Yagyu¹, Takeshi Ihara¹, Makiko Yamauchi¹ (1.Nat'l Inst. Tech. Sasebo Col.)

Keywords:Powder Target,Pulsed Laser Deposition,Plasma Processing

We have been developed to prepared functional thin films by the pulsed laser deposition method using powder target. In this experiment, titanium oxide thin film were prepared using the back side irradiation pulsed laser deposition method using TiO₂ powder target. As the results, TiO₂ thin film can be prepared by the method. Deposition rate of the film of this method was lower than the normal PLD method. The crystallinity of the prepared film was changed by annealing after deposition.