The 63rd JSAP Spring Meeting, 2016

Presentation information

Oral presentation

3 Optics and Photonics » 3.7 Laser processing

[19p-W321-1~14] 3.7 Laser processing

Sat. Mar 19, 2016 1:30 PM - 5:30 PM W321 (W2・W3)

Yoshie Ishikawa(AIST), Hiroyuki Wada(Titech), Hiroshi Ikenoue(Kyushu Univ.)

4:15 PM - 4:30 PM

[19p-W321-10] Formation of periodic micro/nanostructure onto silicone rubber surface by vacuum UV laser (2)

Setyo Pambudi Wisnu1, Masayuki Okoshi1, Tsugito Yamashita2 (1.National Defense Academy, 2.Kanto Gakuin University)

Keywords:ArF excimer laser,silicone rubber ; periodic micro/nano-swelling structure,super-hydrophobicity

Single layer of silica glass microspheres 2.5 micron in diameter was formed on silicone rubber surface, then a 193 nm ArF excimer laser irradiated the sample surface at the single-pulse laser fluence of 10 mJ/cm2 and for 60 min irradiation. The pulse repetition rate was 1 Hz. The silicone rubber surface underneath each microsphere selectively swelled during the ArF laser irradiation, of which also found to be periodical at regular intervals of approximately 2.5 micron and 1.3 micron in height. Contact angle of water was measured by the Low Bond Axisymmetric Drop Shape Analysis to be approximately 150 degrees and over on the micro/nanostructured silicone, indicating a clear super hydrophobic property.