The 63rd JSAP Spring Meeting, 2016

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3 Optics and Photonics » 3.7 Laser processing

[19p-W321-1~14] 3.7 Laser processing

Sat. Mar 19, 2016 1:30 PM - 5:30 PM W321 (W2・W3)

Yoshie Ishikawa(AIST), Hiroyuki Wada(Titech), Hiroshi Ikenoue(Kyushu Univ.)

5:00 PM - 5:15 PM

[19p-W321-13] Collisional of TiO2 and Ni plumes during double pulsed laser ablation

〇(B)Keita Katayama1, Katuyoshi Hamaoka1, Tamao Aoki1, Hiroshi Fukuoka3, Takehito Yosida2, Akira Sugimura1, Ikurou Umezu1 (1.Konan Univ., 2.NIT.Anan College, 3.NIT.Nara College)

Keywords:semiconductor,ablation