The 63rd JSAP Spring Meeting, 2016

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

[20a-H111-1~10] 6.3 Oxide electronics

Sun. Mar 20, 2016 9:15 AM - 11:45 AM H111 (H)

Enju Sakai(Univ. of Tokyo)

10:30 AM - 10:45 AM

[20a-H111-6] Band Edge Engineering of Aqueous Solution/Oxide Interface Using Interface Dipoles

YASUYUKI HIKITA1, Kazunori Nishio2, Linsey Seitz2, Pongkarn Chakthranont2, Takashi Tachikawa2,3, Thomas Jaramillo1,2, Harold Hwang1,2 (1.SLAC, 2.Stanford Univ., 3.Univ. Tokyo)

Keywords:photocatalayst,heterostructure,interface dipole

One of the crucial parameters dictating the efficiency of photoelectrochemical water-splitting is the semiconductor band edge alignment with respect to hydrogen and oxygen redox potentials. Despite the importance of metal oxides in their use as photoelectrodes, studies to control the band edge alignment in aqueous solution have been limited predominantly to compound semiconductors with modulation ranges limited to a few hundred mV. We report our studies demonstrating the ability to modulate the flat band potential of oxide photoanodes by as much as 1.3 V, using the insertion of subsurface electrostatic dipoles near a Nb-doped SrTiO3/aqueous electrolyte interface. The tunable range achieved in this study far exceeds previous reports in any semiconductor/aqueous electrolyte system and suggests a general design strategy for highly efficient oxide photoelectrodes.