[20a-S224-1~9] 7.3 Micro/Nano patterning and fabrication

[20a-S224-4] The distribution of polarization inside beam of excimer laser for semiconductor lithography tools

〇Daisuke Tei¹, takahito kumazaki¹, hiroaki tsushima¹, akihiko kurosu¹, takeshi ohta¹, takashi matsunaga¹, hakaru mizoguchi¹ (1.Gigaphoton Inc.)

Keywords:excimer laser

To do linewidth control in multi-patterning of semiconductor lithography more strictly, the polarization is esteemed more.I'll report on a basic technology for polarization control and the value of the beam polarization in the face distribution by comparing an energy intensity distribution of a S polarized light ingredient and an energy intensity distribution of beam origin of a beam as much as possible/measuring technique.