The 63rd JSAP Spring Meeting, 2016

Presentation information

Oral presentation

2 Ionizing Radiation » 2.3 Application, radiation generators, new technology

[20a-W810-1~7] 2.3 Application, radiation generators, new technology

Sun. Mar 20, 2016 9:00 AM - 10:45 AM W810 (W8-E1001)

Jun Kawarabayashi(Tokyo City Univ.)

9:00 AM - 9:15 AM

[20a-W810-1] Reduction of a Beam Diameter Formed by Several Hundred keV Compact Ion Microbeam System (Ⅱ)

Yasuyuki Ishii1, Ohkubo Takeru1 (1.JAEA Takasaki)

Keywords:ion microbeam system

A several hundred keV ion microbeam system has been constructed in JAEA. In the present study the formation of 1 μm diameter ion microbeam is attempted at 120 keV. A 6 μm diameter ion microbeam was already formed using the microbeam system. To know the direction of the ion microbeam system improvement for the beam diameter reduction, an ion beam was experimentally formed by making a shorter distance between the anode and the extraction electrode in the ion source of the microbeam system than the former distance. The 3 μm diameter ion microbeam was formed as a result, which showed the direction of the system improvement.