[20p-H111-1~9] Frontiers of new functional oxides -more oxide, beyond oxide-

[20p-H111-1] Evolution of Mist CVD Technology for Synthesis of Oxide Thin Films

〇Shizuo Fujita¹, Kentaro Kaneko¹ (1.Kyoto Univ.)

Keywords:oxide semiconductor,wide band gap,epitaxial growth

Fundamentals and applications of mist CVD, which allows growth of oxide thin films from safe sources, are reviewed. In this technology, mist particles formed by ultrasonic atomization and transferred by carrier gas are applied as metal sources of the growth. In the advancement of this technology, up-to-date results include epitaxial growth, band gap engineering, two dimensional growth, and superlattices of crystalline semiconductors as well as SiO₂ and Al₂O₃ films.