[20p-H112-1~12] 15.5 Group IV crystals and alloys

[20p-H112-9] Epitaxial growth of single crystalline silicon-germanium thin film on silicon substrates
by solid phase crystallization

〇(M1)Alaa Hassan Hamdoh¹, Kyota Kuroiwa¹, Tetsuya Kaneko¹, Masao Isomura¹ (1.Tokai Univ.)

Keywords:Epitaxial growth,SiGe,Si substrate