[21a-P8-1~27] 16 Amorphous and Microcrystalline Materials（Poster）

▲ [21a-P8-17] Novel optically-rough and physically-flat Zn_1-xMg_xO: Al substrate for superstrate-type thin-film solar cells

〇(D)Lei Meng¹, Shinsuke Miyajima¹ (1.Tokyo Inst. of Tech.)

Keywords:transparent conductive oxides,thin-film solar cells,ZnMgO

Novel optically-rough and physically-flat (OR-PF) Zn_1-xMg_xO:Al thin film substrate was developed for superstrate-type thin-film solar cells. It was fabricated by spin-coating sol-gel Al doped Zn_1-xMg_xO (AZMO) thin film on roughened glass substrate with a two-dimensional grating structure. Uniform and periodic feature size was formed on the glass substrate by using room-temperature nanoimprinting technique. Effect of shape and period of feature size on the optical properties of OR-PF AZMO substrate was investigated. It was applied as the front electrode of hydrogenated amorphous silicon (a-Si:H) single junction solar cells. Figure 1 shows the SEM micrographs of glass substrate imprinted with hole pattern (Period (P) =1.7 mm) and OR-PF AZMO/hole patterned glass substrate. The AZMO/hole (P=1.7 mm) patterned substrate shows low optical absorption, an average haze ratio in transmission of 13.1 % at wavelength region of 700-850 nm, a low surface roughness, and a sheet resistance of 62.7 Ω/sq. These results suggest the potential of this OR-PF AZMO substrate for the front electrode of superstrate-type thin-film solar cells.