2016年第63回応用物理学会春季学術講演会

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一般セッション(口頭講演)

6 薄膜・表面 » 6.4 薄膜新材料

[21p-H103-1~21] 6.4 薄膜新材料

2016年3月21日(月) 13:15 〜 19:00 H103 (本館)

遠藤 民生(岐阜大)、名村 今日子(京大)、永田 知子(日大)

14:45 〜 15:00

[21p-H103-7] An effective approach to synthesize monolayer tungsten disulfide crystals using tungsten hexachloride

〇(D)Thangaraja Amutha1、Shinde Sachin1、Kalita Golap1、Tanemura Masaki1 (1.Nagoya Inst.Technol.)

キーワード:WS2,CVD,solution casting

The transition metal dichalcogenides (TMDs) based layered materials (MoS2, WS2 etc.) have attracted significant interest as two dimensional (2D) semiconductor with a direct band gap. Recently, WS2 has gaining a lot of attention and it is constructed with a sandwich of two atomic layers of S and one atomic layer of W through covalent W–S bonds, respectively [1]. Here, we demonstrate a process to control the nuclei for growth of large WS2 crystals by solution-casting the WCl6 precursor on substrate. In the developed process, a 0.05M solution of WCl6 was drop-casted on the substrate, which was loaded in the center of small diameter tube sealed at one-end. A boat with 200 mg of S powder was placed in the center of low temperature furnace. Sulfurization experiments were performed at a temperature of 750 C in 80 sccm Ar atmosphere. Finally, the furnace was cooled down to room temperature and samples were removed from the tube.
We observed the growth of triangular (more than 50 μm), star-shaped WS2 crystals. Figure 1a shows a triangular monolayer WS2 crystal of 50 μm size. Figure 1b shows a six pointed star-shaped crystal. Figure 1c shows an AFM image of the as-synthesized WS2 crystal on SiO2/Si substrate. Line profile at the edge revealed an approximate thickness of around 0.9 nm, which is almost comparable to monolayer WS2 crystal.