The 63rd JSAP Spring Meeting, 2016

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

[21p-H111-1~22] 6.3 Oxide electronics

Mon. Mar 21, 2016 1:00 PM - 6:45 PM H111 (H)

Hisashi Shima(AIST), Yasuhisa Naitoh(AIST)

3:00 PM - 3:15 PM

[21p-H111-9] Characterization of Resistive Transition Phenomena of Sputter-Deposition SiO2 Films

Takuya Akano1, Rintaro Yamaguchi1, Shingo Sato1, Yasuhisa Omura1 (1.Kansai Univ.)

Keywords:SiO2,resistive transition phenomena,compliance current

In this study, we successfully demonstrated that the reset event strongly depends on the compliance current at the set event. It was clrealy shown that the increase and the decrease in the compliance current rules the primary mechanism of the reset event.