The 63rd JSAP Spring Meeting, 2016

Presentation information

Oral presentation

15 Crystal Engineering » 15.3 III-V-group epitaxial crystals

[21p-H112-1~13] 15.3 III-V-group epitaxial crystals

Mon. Mar 21, 2016 1:15 PM - 4:45 PM H112 (H)

Tomoyuki Miyamoto(Titech)

2:15 PM - 2:30 PM

[21p-H112-5] Annealing effect of InGaAsN/GaAsSb quantum wells diodes on InP substrates(Ⅱ)

Yuichi Kawamura1,2, Ikuya Shishido1, Sho Tanaka1, Shuichi Kawamata1,2 (1.OPU, 2.ROUC)

Keywords:compound semiconductor,quantum well

Annwaling effect on emission properties was studied for InGaAsN/GaAsSb type II diodes. It was found that remarkable red-shift as long as 4 mm was observed by 600℃ annealing.