The 63rd JSAP Spring Meeting, 2016

Presentation information

Oral presentation

7 Beam Technology and Nanofabrication » 7.2 Applications and technologies of electron beams

[21p-H137-1~22] 7.2 Applications and technologies of electron beams

Mon. Mar 21, 2016 1:15 PM - 7:00 PM H137 (H)

Yoichiro Neo(Shizuoka Univ.), Hitoshi Nakahara(Nagoya Univ.), Yasuhito Gotoh(Kyoto Univ.)

5:15 PM - 5:30 PM

[21p-H137-16] Gamma-ray tolerance of CdTe photodiode for radiation tolerant FEA image sensor

Tomoya Igari1, Joe Koguchi1, Tamotsu Okamoto1, Yasuhito Gotoh2, Nobuhiro Sato2, Masafumi Akiyoshi3, Ikuji TAKAGI2 (1.NIT, Kisarazu Coll., 2.Kyoto Univ., 3.Osaka Pref. Univ.)

Keywords:CdTe,II-VI compounds,field emitter array

The effect of gamma irradiation on two types (superstrate- and substrate-type) of CdS/CdTe photodiodes, which we have proposed as potential photoconducting films for compact image sensors with a field emitter array (FEA), was investigated. A 60Co gamma-ray source was employed, and the total gamma irradiation dose was more than 1 MGy. For the superstrate-type structure, the irradiation caused the short-circuit current density (JSC) to decrease, probably due to the resulting decreased transmittance of the glass substrate. On the other hand, little degradation of the I-V characteristics or spectral response was observed after the gamma irradiation for the substrate-type structure. These results suggest that, taking into account the decrease in transmittance of the glass substrate, the CdS/CdTe photodiodes have sufficient tolerance to high gamma-ray exposure.