The 63rd JSAP Spring Meeting, 2016

Presentation information

Poster presentation

15 Crystal Engineering » 15.5 Group IV crystals and alloys

[21p-P9-1~9] 15.5 Group IV crystals and alloys

Mon. Mar 21, 2016 1:30 PM - 3:30 PM P9 (Gymnasium)

1:30 PM - 3:30 PM

[21p-P9-7] Morphologies of tensile-strained Si/relaxed SiGe/Si(110) heterostructures employing vicinal substrate and device characteristic

naoto utsuyama1, kei sato1, takane yamada1, keisuke arimoto1, junji yamanaka1, kiyokazu nakagawa1, kousuke hara1, noritaka usami2, kentaro sawano3 (1.CCST Univ. of Yamanashi, 2.Nagoya Univ., 3.ARL Tokyo City Univ.)

Keywords:semiconductor,strained-Si